METHOD AND COMPOSITIONS FOR HARDENING PHOTORESIST IN ETCHING PROCESSES,申请号KR20057002028-传众专利搜索

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发明名称	METHOD AND COMPOSITIONS FOR HARDENING PHOTORESIST IN ETCHING PROCESSES
摘要
申请公布号	KR100990064(B1)	申请公布日期	2010.10.26
申请号	KR20057002028	申请日期	2003.07.31
申请人		发明人
分类号	G03F7/40;H01L21/027;H01L21/3065;H01L21/308;H01L21/311;H01L21/3213	主分类号	G03F7/40
代理机构		代理人
主权项
地址

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