发明名称 LITHOGRAPHIC APPARATUS, POSITIONING SYSTEM, AND POSITIONING METHOD
摘要 <p>PURPOSE: A lithographic apparatus, a positioning system, and a positioning method thereof are provided to stop a control when the control has problems and to return a target to an original position moving a frame. CONSTITUTION: A lithographic apparatus, positioning system, and positioning method includes a measuring system, an actuator, and a controller(CS). The measuring system measures the position of a movable object(MO). The actuator applies force to the movable object. The controller applies a driving signal to the actuator based on the output of the measuring system.</p>
申请公布号 KR20100114473(A) 申请公布日期 2010.10.25
申请号 KR20100034362 申请日期 2010.04.14
申请人 ASML NETHERLANDS B.V. 发明人 SMEETS ERIK MARIE JOSE
分类号 H01L21/027 主分类号 H01L21/027
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