PLASMA IMPLANTATION SYSTEM WITH TARGET MOVEMENT

摘要

PURPOSE: A target movement type plasma injector is provided to improve doping uniformity by discharging plasma to an exhaust pipe which is formed in the wafer loading location of a stage. CONSTITUTION: A wafer drive part(120) sequentially drives a wafer(W) in the direction of a target. The wafer drive part comprises a stage(122) and a stage driving part(126). The stage includes an exhaust pipe in the location of a wafer which is loaded. The exhaust pipe is radially formed around the wafer. The exhaust pipe is connected to a vacuum pump which converts the inside of chamber into a vacuum condition.