ACTINIC-RAY- OR RADIATION-SENSITIVE RESIN COMPOSITION, AND METHOD OF FORMING PATTERN USING THE COMPOSITION

摘要

PROBLEM TO BE SOLVED: To provide a positive resin composition superior in development residue and outgassing performance, and to provide a method of forming a pattern using the positive resist composition.

SOLUTION: The positive resin composition comprises (A) any of compounds expressed by General Formula (I) and (B) a resin that contains a residue (c) of a compound having an ionization potential value lower than that of phenol and when acted on by an acid, exhibits an increased solubility in alkali. In Formula (I): Ar represents an aromatic ring having Cy groups and optionally further other substituents; n is an integer of 2 or greater; Cy represents a group having a substituted or unsubstituted alkyl group or a group having a substituted or unsubstituted cycloaliphatic group, provided that a plurality of Cy groups may be identical with or different from each other; and M+represents an organic onium ion.

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