| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a photomask blank, giving higher dimensional control performance to a photomask, and a photomask, produced using the photomask blank. <P>SOLUTION: The photomask blank includes on a transparent substrate: a light shielding film which may contain transition metals and is formed of silicon material; and an etching film, which is formed of chromium compound material and all separated in one process in the course of working from the photomask blank into a photomask. The etching mask film is deposited by reactive sputtering, and formed of a multi-layer including two or more layers different in composition from one another. When the multi-layer is deposited as a single composition layer on the transparent substrate, the photomask blank comprises by combining a layer made of material imparting compression stress and a layer made of material imparting tensile stress. By using the photomask blank, before and after removing the etching mask film by etching, a change in surface topography is a little, whereby it is possible to improve pattern controllability of a photomask obtained after the end of photomask processing. <P>COPYRIGHT: (C)2011,JPO&INPIT |
