发明名称 |
OPTICAL SYSTEM CORRECTION METHOD FOR MASKLESS EXPOSURE DEVICE |
摘要 |
<P>PROBLEM TO BE SOLVED: To solve the following problem: matching property of overlapped parts of each exposure area 81-87 is lost due to difference in magnification ratio of projection of a projection lens or the like of each engine of a maskless exposure device. <P>SOLUTION: In this optical system correction method for the maskless exposure device, ratio of expansion and contraction of projection depending on magnification ratio of projection of each engine is measured in advance in addition to correction of usual data expansion and contraction matching with a workpiece, a start dot position of each engine is mechanically adjusted to an accurate interval of engines in design, and then drawing data of each engine is corrected by the measured ratio of expansion and contraction of projection about each engine is corrected. <P>COPYRIGHT: (C)2011,JPO&INPIT |
申请公布号 |
JP2010237420(A) |
申请公布日期 |
2010.10.21 |
申请号 |
JP20090084932 |
申请日期 |
2009.03.31 |
申请人 |
HITACHI VIA MECHANICS LTD |
发明人 |
YAMAGAMI KENTARO;OSAKA YOSHIHISA;ARAI TOSHIHIRO |
分类号 |
G03F7/20;G02B27/18;G02F1/1335;H01L21/027 |
主分类号 |
G03F7/20 |
代理机构 |
|
代理人 |
|
主权项 |
|
地址 |
|