发明名称 OPTICAL SYSTEM CORRECTION METHOD FOR MASKLESS EXPOSURE DEVICE
摘要 <P>PROBLEM TO BE SOLVED: To solve the following problem: matching property of overlapped parts of each exposure area 81-87 is lost due to difference in magnification ratio of projection of a projection lens or the like of each engine of a maskless exposure device. <P>SOLUTION: In this optical system correction method for the maskless exposure device, ratio of expansion and contraction of projection depending on magnification ratio of projection of each engine is measured in advance in addition to correction of usual data expansion and contraction matching with a workpiece, a start dot position of each engine is mechanically adjusted to an accurate interval of engines in design, and then drawing data of each engine is corrected by the measured ratio of expansion and contraction of projection about each engine is corrected. <P>COPYRIGHT: (C)2011,JPO&INPIT
申请公布号 JP2010237420(A) 申请公布日期 2010.10.21
申请号 JP20090084932 申请日期 2009.03.31
申请人 HITACHI VIA MECHANICS LTD 发明人 YAMAGAMI KENTARO;OSAKA YOSHIHISA;ARAI TOSHIHIRO
分类号 G03F7/20;G02B27/18;G02F1/1335;H01L21/027 主分类号 G03F7/20
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