| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a photomask blank which is high in sensitivity and can form a pattern superior in resolution, and to provide a photomask which is superior in film strength of a light shielding film and resistance to a solvent in mask cleaning even when having a finer pattern such as narrow lines. <P>SOLUTION: The photomask blank has, on a substrate, a photosensitive composition layer containing a binder polymer (A), a compound (B) having two or more vinylphenyl groups in a molecule, a polymerization initiator (C), and a light shielding material (D). <P>COPYRIGHT: (C)2011,JPO&INPIT |
