发明名称 MEMORY ELEMENT ON SILICON ON GLASS THIN FILM STRUCTURE
摘要 FIELD: physics. ^ SUBSTANCE: in a memory element which comprises a substrate with deposited thin layers of ceric and silicon oxide and metal electrodes for recording and deleting information is made from glass which is pre-cleaned with acetone and isopropyl alcohol, on which a ceric oxide layer is deposited at temperature higher than 600C and thickness of more than 3 nm and a silicon film with thickness of 50-100 nm. ^ EFFECT: invention prolongs information storage period, simplifies the manufacturing technology and reduces production expenses. ^ 4 cl, 4 dwg
申请公布号 RU2402107(C2) 申请公布日期 2010.10.20
申请号 RU20060136113 申请日期 2006.10.12
申请人 MILOVZOROV DMITRIJ EVGEN'EVICH 发明人 MILOVZOROV DMITRIJ EVGEN'EVICH
分类号 B82B1/00;H01L29/786 主分类号 B82B1/00
代理机构 代理人
主权项
地址