发明名称 |
SOLUTION FOR TREATMENT OF RESIST SUBSTRATE AFTER DEVELOPMENT PROCESSING, AND METHOD FOR TREATMENT OF RESIST SUBSTRATE USING THE SAME |
摘要 |
<p>The present invention provides a resist substrate-treating solution for improving defects on a developed pattern surface, and also provides a resist substrate treatment method employing the treating solution. The resist substrate-treating solution comprises a solvent and a nitrogen-containing or oxygen-containing water-soluble polymer such as a polyamine, a polyol or a polyether. In the treatment method, a developed resist pattern is treated with the resist substrate-treating solution and then washed with pure water.</p> |
申请公布号 |
EP2088469(A4) |
申请公布日期 |
2010.10.20 |
申请号 |
EP20070829714 |
申请日期 |
2007.10.12 |
申请人 |
AZ ELECTRONIC MATERIALS USA CORP. |
发明人 |
NOYA, GO;SHIMAZAKI, RYUTA;KOBAYASHI, MASAKAZU |
分类号 |
G03F7/32;H01L21/027;H01L21/304 |
主分类号 |
G03F7/32 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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