| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a resist composition superior in filtering and line width uniformity, and to provide a pattern forming method using the same. <P>SOLUTION: There are provided the positive resist composition including: (A) an acidolysis resin containing a specific repetition structural unit having an annular alkyl structure; (B) an acid generating agent; and (C) a mixed solvent containing at least one solvent selected from the following (a) group and at least one solvent selected from the following (b) to (d) groups and the pattern forming method. (a) group: alkylene glycol monoalkyl ether. (b) group: alkylene glycol monoalkyl ether carboxylate. (c) group: straight chain ketone, branched chain ketone, annular ketone, lactone, and alkylene carbonate. (d) group: lactate ester, acetic acid ester, and alkoxy propionic acid ester. <P>COPYRIGHT: (C)2011,JPO&INPIT |
