发明名称 INDIUM OXIDE-BASED ELECTRICALLY CONDUCTIVE TRANSPARENT FILM, AND PROCESS FOR PRODUCTION THEREOF
摘要 <p>Disclosed is an electrically conductive transparent film which can be produced in the form of an amorphous film that can be patterned easily by weak acid etching and can be crystallized easily, wherein the crystallized film has a low resistivity and a high transmissivity. The film is produced in the form of an amorphous film using a sputtering target that comprises a sintered oxide material comprising indium oxide and optionally tin, and additionally comprising at least one additive element selected from the group consisting of Sr, Li, La, Ca, Mg and Y, under conditions where the partial pressure of water is 1.0 × 10-4 to 1.0 × 10-1 Pa inclusive.</p>
申请公布号 WO2010116981(A1) 申请公布日期 2010.10.14
申请号 WO2010JP56195 申请日期 2010.04.06
申请人 MITSUI MINING & SMELTING CO., LTD.;TAKAHASHI SEIICHIRO;MIYASHITA NORIHIKO;IKEDA MAKOTO 发明人 TAKAHASHI SEIICHIRO;MIYASHITA NORIHIKO;IKEDA MAKOTO
分类号 C23C14/08;C23C14/34;H01B5/14;H01B13/00 主分类号 C23C14/08
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