| 发明名称 |
SYSTEM, METHOD AND APPARATUS FOR LASER PRODUCED PLASMA EXTREME ULTRAVIOLET CHAMBER WITH HOT WALLS AND COLD COLLECTOR MIRROR |
| 摘要 |
<p>A system and method for an extreme ultraviolet light chamber comprising a collector mirror, a cooling system coupled to a backside of the collector mirror operative to cool a reflective surface of the collector mirror and a buffer gas source coupled to the extreme ultraviolet light chamber.</p> |
| 申请公布号 |
WO2010117859(A1) |
申请公布日期 |
2010.10.14 |
| 申请号 |
WO2010US29441 |
申请日期 |
2010.03.31 |
| 申请人 |
CYMER, INC.;PARTLO, WILLIAM N.;FOMENKOV, IGOR V. |
发明人 |
PARTLO, WILLIAM N.;FOMENKOV, IGOR V. |
| 分类号 |
G01J1/42 |
主分类号 |
G01J1/42 |
| 代理机构 |
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