| 摘要 |
PROBLEM TO BE SOLVED: To provide a substrate-holding mechanism capable of surely feeding or rotating a substrate, and to provide a substrate-processing apparatus which includes the substrate-holding mechanism. SOLUTION: A substrate-processing apparatus includes a spin chuck for holding and rotating a substrate. The spin chuck includes a movable pin that is capable of displaced between an opening position and a closing position and is abutted against a circumferential end face of the substrate at an abutting position between the opening position and the closing position for holding the substrate; a magnet 62, which is interlocked with the movable pin with a displacing amount corresponding to a displacing amount of the movable pin and is displaced between an opening detecting position and a closing detecting position corresponding to the opening position and the closing position, respectively; a sensor 64 for detecting a magnetic field that varies, according to the position of the magnet 62 between the opening detecting position and the closing detecting position; and a control section 63 for detecting the position of the movable pin between the opening position and the closing position, on the basis of a detection value of the sensor 64. COPYRIGHT: (C)2011,JPO&INPIT |
