DISPLAY DEVICE AND METHOD FOR MANUFACTURING DISPLAY DEVICE

摘要

PROBLEM TO BE SOLVED: To more simply perform fine wiring of copper to a silicon nitride film in a thin film transistor substrate of a display device. SOLUTION: A TFT substrate on which the fine wiring is performed is provided with: a glass substrate 101 consisting of alkali free glass; a transparent conductive film 102 consisting of indium tin oxide; first conductive films 103 and 109 consisting of an alloy containing aluminum by four atom% and copper as a principal component; second conductive layers 104 and 110 which are copper wirings consisting of pure copper of purity 99.99%; a gate insulating film 106 consisting of silicon nitride; a semiconductor layer 107 consisting of amorphous silicon; a contact layer 108 consisting of n+ type amorphous silicon; and a metal oxide layer 105 of an interface between the transparent conductive film 102 and the first conductive layer 103. COPYRIGHT: (C)2011,JPO&INPIT