| 摘要 |
PROBLEM TO BE SOLVED: To provide an electron beam processing device capable of automatically adjusting a filament current value. SOLUTION: The device is provided with irradiation means (5, 1) irradiating electron beams, an acquisition means (3) for detecting beam current of electron beams irradiated from the irradiation means (5, 1) and acquiring a bias voltage value in accordance with a difference between the actual beam current value detected and a beam current direction value, and an adjustment means (4) for adjusting a filament current value used as the irradiation means (5, 1) irradiate the electron beams. The adjustment means (4) calculates a rate of changes of bias voltage values based on a plurality of bias voltage values acquired by the acquisition means (3) and adjusts the filament current value so that the rate of changes of the bias voltage values calculated is to be converged to a given target value. COPYRIGHT: (C)2011,JPO&INPIT
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