发明名称 Lithographic apparatus and device manufacturing method using repeated patterns in an LCD to reduce datapath volume
摘要 A method and device for programming an array of individually controllable elements configured to impart a beam with a pattern. For example, the method can be suitable for use in a lithographic apparatus. The method includes generating first data representing a first pattern, generating second data representing a second pattern, writing the first data to a first buffer, and reading the first data from the first buffer to program the array of individually controllable elements to display the first pattern, while writing the second data to a second buffer in parallel.
申请公布号 US7812930(B2) 申请公布日期 2010.10.12
申请号 US20050084866 申请日期 2005.03.21
申请人 ASML NETHERLANDS B.V. 发明人 VAN DEN AKKER THEODORUS LEONARDUS;HOEKS MARTINUS HENDRICUS HENDRICUS;DE JAGER PIETER WILLEM HERMAN;KESSELS LAMBERTUS GERARDUS MARIA;VAN HASSEL MARCO CORNELIS JACOBUS MARTINUS;MORSELT FRANK ANTON
分类号 G03B27/32 主分类号 G03B27/32
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