发明名称 APPARATUS FOR PLASMA TREATMENT
摘要 PURPOSE: An apparatus for plasma treatment is provided to maximize a modification effect on the surface of an LED package due to plasma by using a magazine as an electrode. CONSTITUTION: A plasma processing apparatus comprises a chamber(10), a first electrode(20), a second electrode(30), and at least one magazine electrode(40). A first electrode is arranged inside the chamber. A second electrode is arranged inside the chamber and separated from the first electrode. A second electrode has at least one mounting unit. A magazine electrode is detachable from the mounting unit of the second electrode. A plurality of LED packages are loaded in the magazine electrode. The second electrode and magazine electrode are formed with the same conductive material.
申请公布号 KR20100109082(A) 申请公布日期 2010.10.08
申请号 KR20090027491 申请日期 2009.03.31
申请人 SEOUL SEMICONDUCTOR CO., LTD. 发明人 YOON, SEAN JHIN;OH, KWANG YONG;BAE, YUN JEONG
分类号 H01L21/324 主分类号 H01L21/324
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