发明名称 |
APPARATUS FOR PLASMA TREATMENT |
摘要 |
PURPOSE: An apparatus for plasma treatment is provided to maximize a modification effect on the surface of an LED package due to plasma by using a magazine as an electrode. CONSTITUTION: A plasma processing apparatus comprises a chamber(10), a first electrode(20), a second electrode(30), and at least one magazine electrode(40). A first electrode is arranged inside the chamber. A second electrode is arranged inside the chamber and separated from the first electrode. A second electrode has at least one mounting unit. A magazine electrode is detachable from the mounting unit of the second electrode. A plurality of LED packages are loaded in the magazine electrode. The second electrode and magazine electrode are formed with the same conductive material.
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申请公布号 |
KR20100109082(A) |
申请公布日期 |
2010.10.08 |
申请号 |
KR20090027491 |
申请日期 |
2009.03.31 |
申请人 |
SEOUL SEMICONDUCTOR CO., LTD. |
发明人 |
YOON, SEAN JHIN;OH, KWANG YONG;BAE, YUN JEONG |
分类号 |
H01L21/324 |
主分类号 |
H01L21/324 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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