| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a negative resist composition excellent in resolution and a resist pattern forming method. <P>SOLUTION: This negative resist composition contains (A) alkali soluble resin components, (B) acid producing agent components producing acid by exposing to light, and (C) bridging agent components. The above (A) alkali soluble resin component is a copolymer (A1) containing a composing unit (a1) containing aliphatic ring machine having a fluorinated hydroxy alkyl group, and a composing unit (a2) derived from acrylic ester containing hydroxyl group content aliphatic ring machine. The (C) bridging agent component contains alkylene urea system bridge agents (C1). <P>COPYRIGHT: (C)2007,JPO&INPIT |
