发明名称 |
ILLUMINATION CONTROL MODULE, DIFFRACTION ILLUMINATION SYSTEM AND PHOTOLITHOGRAPHY SYSTEM INCLUDING THE SAME |
摘要 |
<p>PURPOSE: An illumination control module, a diffraction illumination system and a photolithography system including the same are provided to improve productivity in various photolithography processes by applying one diffraction lighting system to various photolithography process. CONSTITUTION: An illumination control module(100) comprises an upper lens(110) and a lower lens(120). The upper lens has a swollen ring shape. The lower lens has a concave ring shape. The absolute value of a focus distance of the lower lens is different to that of the upper lens. The circular constant of the lower lens is same as that of the upper lens. The horizontal width of the lower lens is smaller than the that of the upper lens. The upper lens and lower lens are independently moved up and down.</p> |
申请公布号 |
KR20100109164(A) |
申请公布日期 |
2010.10.08 |
申请号 |
KR20090027623 |
申请日期 |
2009.03.31 |
申请人 |
SAMSUNG ELECTRONICS CO., LTD. |
发明人 |
SHIM, WOO SEOK;CHUN, YONG JIN;LEE, SUK JOO |
分类号 |
H01L21/027;G03F7/20 |
主分类号 |
H01L21/027 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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