发明名称 SPACER ELEMENT AND METHOD FOR MANUFACTURING A SPACER ELEMENT
摘要 <p>A spacer wafer for a wafer stack includes a spacer body with a first surface and a second surface, and is intended to be sandwiched between a first wafer and a second wafer. That is, the spacer is to keep a first wafer placed against the first surface and a second wafer placed against the second surface at a constant distance from each other. The spacer provides openings arranged such that functional elements of the first wafer and of the second wafer can be aligned with the openings. The spacer is formed from a forming tool by means of a shape replication process and is preferably made of a material hardened by curing. At least one of the first and second surface includes edges separating the surface from the openings, and the thickness of the spacer wafer at the edges exceeds the thickness of the spacer wafer at surface locations around the edges.</p>
申请公布号 KR20100109553(A) 申请公布日期 2010.10.08
申请号 KR20107015940 申请日期 2008.12.16
申请人 HEPTAGON OY 发明人 ROSSI MARKUS;RUDMANN HARTMUT;SPRING NICOLA;BIETSCH ALEXANDER
分类号 G02B6/42;H01L27/146 主分类号 G02B6/42
代理机构 代理人
主权项
地址