| 摘要 |
PURPOSE: A manufacturing method of polishing pad which can continuously maintain regular polishing result, and a polishing pad which manufactured by the same are provided to improve polishing capacity by repeatedly arranging functional layers of high air permeability, base layers of low air transmission rate, and polishing layers, in a longitudinal direction. CONSTITUTION: A manufacturing method of polishing pad is as follows. A sheet for forming a grinding pad formation is wound in a roll shape. A sheet roll(R) is cut by a cutter(K) at a tilt 45~90° based on a center axis to be 0.5~5mm.
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