| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide an active ray-sensitive or radiation-sensitive resin composition which is suitable for a liquid immersion process having a line width of 50 nm or less, and improved in line edge roughness, characteristics in the depth of focus width and storage stability, and to provide a pattern forming method using the composition. <P>SOLUTION: The active ray-sensitive or radiation-sensitive resin composition contains (A) a resin that has a repeating unit having a specified lactone structure and has a solubility with an alkali developing solution increased by an action of an acid, and (B) a compound that generates an acid by irradiation with active rays or radiation, wherein the monomer component contained in the resin (A) is not more than 1.0 mass% of the resin (A). The pattern forming method using the resin composition is also provided. <P>COPYRIGHT: (C)2011,JPO&INPIT |
