GATE VALVE STRUCTURE AND SUBSTRATE PROCESSOR EQUIPED WITH THE SAME
摘要
<p>Disclosed is a gate valve structure including a valve box having a port with a first valve seat and a second valve seat and a valve provided with a sealing member intended to seal the port. The gate valve structure is further provided with a shielding member capable of deflecting to sit on the second valve seat when the valve closes the port thereby shielding the room between the sealing member and the port such that the shielding member deflects to maintain contact between the shielding member and the second valve seat when the valve closes the port under the normal condition as well as under a high temperature.</p>
申请公布号
WO2010113891(A1)
申请公布日期
2010.10.07
申请号
WO2010JP55599
申请日期
2010.03.29
申请人
TOKYO ELECTRON LIMITED;HIROKI, TSUTOMU;NOSE, MASAAKI;MATSUSHITA, MASANAO;NISHIBA, TAKEHIRO