发明名称 |
PHOTOLITHOGRAPHY SYSTEMS AND ASSOCIATED METHODS OF SELECTIVE DIE EXPOSURE |
摘要 |
Several embodiments of photolithography systems and associated methods of selective die exposure are disclosed herein. In one embodiment, a method for exposing a microelectronic substrate in a photolithography system includes producing an illumination radiation from a radiation source and identifying a field on the microelectronic substrate to be exposed. The field is partitioned into a first region discrete from a second region. The method further includes inhibiting the illumination radiation to expose the first region while simultaneously exposing the second region to the illumination radiation.
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申请公布号 |
US2010253929(A1) |
申请公布日期 |
2010.10.07 |
申请号 |
US20090419744 |
申请日期 |
2009.04.07 |
申请人 |
MICRON TECHNOLOGY, INC. |
发明人 |
STANTON WILLIAM A.;SANDHU GURTEJ S. |
分类号 |
G03B27/72;G02F1/03;G03F7/20 |
主分类号 |
G03B27/72 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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