发明名称 METHOD FOR ADJUSTING POSITION OF LASER EMITTING DEVICE
摘要 <p>Performed is a process of setting, on a mounting table, an adjustment substrate, which is provided with a slit of a preset width extended toward a center from a peripheral portion of the adjustment substrate; irradiating the laser beam toward a light receiving surface of a light energy measuring device, which is disposed on a front surface side of the adjustment substrate, from a rear surface side of the adjustment substrate through the slit; and measuring a variation in an energy amount of the laser beam irradiated onto the light receiving surface by the light energy measuring device while moving the laser emitting device in the optical axis direction, and adjusting a position of the laser emitting device in the optical axis direction to a desired position based on the variation in the energy amount on the light receiving surface.</p>
申请公布号 KR100984692(B1) 申请公布日期 2010.10.01
申请号 KR20087027055 申请日期 2007.08.27
申请人 发明人
分类号 H01L21/027 主分类号 H01L21/027
代理机构 代理人
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