| 摘要 |
Disclosed is a substrate processing apparatus for carrying a substrate W in a standing position and performing a predetermined process to the substrate W, including: a plurality of substrate processing chambers; and a common carrying delivery chamber for carrying a substrate to each of the substrate processing chambers, where: at least one of the substrate processing chambers is provided above or below the common carrying delivery chamber; and a substrate passage opening through which the substrate W can pass is provided at the boundaries between the processing chambers and the carrying chamber.
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