发明名称 Focused ion beam system
摘要 A focused ion beam system comprises a specimen chamber, a FIB column, a SEM stage, a side entry stage, a TEM specimen holder, a micro-sampling manipulator, and a SEM holder exchanger chamber. The SEM stage comprises an x-table, a y-table, a z-table, a rotation table, and a tilt table for moving a specimen. The side entry stage comprises an x-micromotion driver and a yzt-micromotion driver which are disposed in the specimen chamber to oppose each other. The x-micromotion driver is disposed in a hollow area defined in a tilt shaft provided for the tilt table.
申请公布号 US7015483(B2) 申请公布日期 2006.03.21
申请号 US20040863480 申请日期 2004.06.09
申请人 HITACHI HIGH-TECHNOLOGIES CORPORATION 发明人 SUZUKI WATARU;HAZAKI EIICHI
分类号 G01N1/32;H01J37/20;G01N1/28;H01J37/18;H01J37/30;H01J37/305;H01J37/317 主分类号 G01N1/32
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