| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide the configuration and the operation of a modified level sensor. <P>SOLUTION: The level sensor measures the height of a substrate surface in a lithographic apparatus, and is equipped with a light source to emit light for detection to the substrate, and a measuring unit to measure the light reflected at the substrate. The light source in the lithographic apparatus emits irradiation for detecting a wavelength range reacted by a resist used for treating the substrate. <P>COPYRIGHT: (C)2010,JPO&INPIT |
