发明名称 |
Photosensitive Resin Composition, Photosensitive Element Using Same, Method for Forming Resist Pattern, and Method for Producing Printed Wiring Board |
摘要 |
The photosensitive resin composition of the invention is characterized by comprising (A) a binder polymer, (B) a photopolymerizing compound with at least one polymerizable ethylenic unsaturated bond in the molecule, (C) a photopolymerization initiator and (D) a compound represented by the following general formula (1). In formula (1), R1, R2, R3 and R4 are each independently hydrogen or a compound of the following general formula (2). In general formula (2), R5 represents a C4-30 hydrocarbon group.
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申请公布号 |
US2010248162(A1) |
申请公布日期 |
2010.09.30 |
申请号 |
US20070294989 |
申请日期 |
2007.03.14 |
申请人 |
HITACHI CHEMICAL COMPANY, LTD. |
发明人 |
WATANABE MITSUAKI |
分类号 |
G03F7/20;G03F7/004;H05K3/06;H05K3/10 |
主分类号 |
G03F7/20 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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