发明名称 Photosensitive Resin Composition, Photosensitive Element Using Same, Method for Forming Resist Pattern, and Method for Producing Printed Wiring Board
摘要 The photosensitive resin composition of the invention is characterized by comprising (A) a binder polymer, (B) a photopolymerizing compound with at least one polymerizable ethylenic unsaturated bond in the molecule, (C) a photopolymerization initiator and (D) a compound represented by the following general formula (1). In formula (1), R1, R2, R3 and R4 are each independently hydrogen or a compound of the following general formula (2). In general formula (2), R5 represents a C4-30 hydrocarbon group.
申请公布号 US2010248162(A1) 申请公布日期 2010.09.30
申请号 US20070294989 申请日期 2007.03.14
申请人 HITACHI CHEMICAL COMPANY, LTD. 发明人 WATANABE MITSUAKI
分类号 G03F7/20;G03F7/004;H05K3/06;H05K3/10 主分类号 G03F7/20
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