| 摘要 |
PROBLEM TO BE SOLVED: To improve positioning accuracy of a pattern in the circumferential direction in an electron beam lithography method to conduct pattern drawing by irradiation of an electron beam. SOLUTION: Among variations of encoder signals from an encoder occurring within one rotation of a rotating stage in pattern drawing, a fixed frequency component commonly appearing in a plurality of rotations with the number of rotations different from one another, is compensated by deflection correction of the electron beam in the circumferential direction, and among variations of the encoder signal, a variable frequency component other than the fixed frequency component is compensated by varying the clock frequency of a drawing clock. COPYRIGHT: (C)2010,JPO&INPIT
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