| 摘要 |
PROBLEM TO BE SOLVED: To provide a lithography apparatus capable of making an angle of inclination of an electron optical lens barrel much smaller when used in a vacuum. SOLUTION: The lithography apparatus includes: an XY stage 105 on which a sample is placed, a lithography chamber 103 in which the XY stage 105 is placed, one side face thereof is provided with an opening 20 having a size through which the XY stage 105 can be carried in or out, and the opening 20 is closed by a door 30 of a separate body; the electron optical lens barrel 102 arranged on the lithography chamber 103; and a rib portion 10 formed in a convex shape on the upper portion of the side face of the lithography chamber 103 on which the opening 20 is formed. According to the invention, the angle of inclination of the electron optical lens barrel can be made much smaller when used under a vacuum atmosphere. COPYRIGHT: (C)2010,JPO&INPIT
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