发明名称 |
PROCESS OF PREPARING AN ANISOTROPIC MULTILAYER USING PARTICLE BEAM ALIGNMENT |
摘要 |
The invention relates to a process of preparing a multilayer comprising two or more anisotropic layers with different optical axes by using a particle beam etching technique, to a multilayer obtained by said process, to the use of such a multilayer as optical compensator or retarder in optical and electrooptical devices, and to devices comprising such a multilayer. |
申请公布号 |
WO2010108593(A1) |
申请公布日期 |
2010.09.30 |
申请号 |
WO2010EP01500 |
申请日期 |
2010.03.11 |
申请人 |
MERCK PATENT GMBH;PARRI, OWAIN, LLYR;YAROSHCHUK, OLEG |
发明人 |
PARRI, OWAIN, LLYR;YAROSHCHUK, OLEG |
分类号 |
G02F1/1337;B32B37/00;G02F1/13363 |
主分类号 |
G02F1/1337 |
代理机构 |
|
代理人 |
|
主权项 |
|
地址 |
|