发明名称 METHOD FOR FORMING PATTERN USING METAL FILM AND APPLICABLE ELEMENT THEREOF
摘要 PURPOSE: A method for forming a pattern using a metal film and an applicable element thereof are provided to remove environment pollution caused by a plating process by removing the planting process. CONSTITUTION: A predetermined sheet or a mold is formed(S110). A copper foil is coated on the surface of products through a sputtering method(S120). A pattern is formed by using a laser on the copper foil(S130). Copper is plated on the copper foil having the pattern to form an antenna having resistance below 1Ω(S140).
申请公布号 KR20100105349(A) 申请公布日期 2010.09.29
申请号 KR20090134136 申请日期 2009.12.30
申请人 SID INC. 发明人 YOO, YONG SANG;KIM, SU JAE
分类号 H01Q1/38;C23C14/34;H01L21/203 主分类号 H01Q1/38
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