发明名称 |
METHOD FOR FORMING PATTERN USING METAL FILM AND APPLICABLE ELEMENT THEREOF |
摘要 |
PURPOSE: A method for forming a pattern using a metal film and an applicable element thereof are provided to remove environment pollution caused by a plating process by removing the planting process. CONSTITUTION: A predetermined sheet or a mold is formed(S110). A copper foil is coated on the surface of products through a sputtering method(S120). A pattern is formed by using a laser on the copper foil(S130). Copper is plated on the copper foil having the pattern to form an antenna having resistance below 1Ω(S140).
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申请公布号 |
KR20100105349(A) |
申请公布日期 |
2010.09.29 |
申请号 |
KR20090134136 |
申请日期 |
2009.12.30 |
申请人 |
SID INC. |
发明人 |
YOO, YONG SANG;KIM, SU JAE |
分类号 |
H01Q1/38;C23C14/34;H01L21/203 |
主分类号 |
H01Q1/38 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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