发明名称 COMPOSITION FOR FORMING SILICON-CONTAINING FILM AND SILICON-CONTAINING FILM AND PROCESS FOR FORMING PATTERN
摘要 PURPOSE: A composition for forming a film containing silicone is provided to obtain excellent storage stability, to have a large content of Si, to be used for forming the silicone-containing the film having superior adhesive force, and to stably form a resist pattern without a hemming. CONSTITUTION: A composition for forming a film containing silicone contains polysiloxane including a structure unit which is marked by chemical formula 1 and a structure unit which is marked by chemical formula 2, and an organic solvent. In chemical formula 1, R^1 is hydrogen or an electron-donating group and R^2 is an organic functional group. In chemical formula 1, n is 0 or 1. In chemical formula 2, R^3 is an alkyl group having a carbon number of 1-8 and R^4 is a monovalent organic functional group.
申请公布号 KR20100103412(A) 申请公布日期 2010.09.27
申请号 KR20100022115 申请日期 2010.03.12
申请人 JSR CORPORATION 发明人 KAWAZU TOMOHARU;TANAKA MASATO;MORI TAKASHI;TAKANASHI KAZUNORI;YASUDA KYOYU
分类号 G03F7/075;H01L21/027 主分类号 G03F7/075
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