发明名称 A TEMPLATE FOR NANO IMPRINT LITHOGRAPHY INCLUDING A COATING LAYER THEREON
摘要 <p>PURPOSE: A template for nano imprint lithography is provided to stably form a pattern by improving irradiation uniformity and reducing the loss of light. CONSTITUTION: An ultraviolet ray transmits a substrate. A stamp pattern(120) is formed on a substrate and has a sloped sidewall. A coating layer(130), which is formed in the sloped sidewall of the stamp pattern. The stamp pattern is formed in a convex and concave form in one region of the substrate.</p>
申请公布号 KR20100103211(A) 申请公布日期 2010.09.27
申请号 KR20090021716 申请日期 2009.03.13
申请人 SAMSUNG ELECTRONICS CO., LTD. 发明人 PARK, CHANG MIN;GOO, DOO HOON;YEO, JEONG HO;PARK, JOO ON;KIM, IN SUNG;LEE, JEONG HOON
分类号 H01L21/027 主分类号 H01L21/027
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