| 摘要 |
PROBLEM TO BE SOLVED: To provide a vacuum processing apparatus capable of preventing positional deviations of a tray and a substrate by reducing warpage of a tray resulting from temperature control even when the tray in use is large-sized enough to mount many substrates. SOLUTION: A chuck capable of holding the tray capable of holding a substrate in a prescribed position in a vacuum vessel includes a vertically movable frame, and an arm extending from the frame toward the tray and capable of supporting the tray. The arm includes a support portion which abuts against the tray, and a counterbore portion formed on that side of the support portion which faces the frame. This structure can reduce the warpage of the tray. COPYRIGHT: (C)2010,JPO&INPIT |
