METHOD FOR MANUFACTURING LC CIRCUIT FORMING MIM CAPACITOR UNDER METAL INTERCONNECTOR-TYPE INDUCTOR WITH WIDE OR SAME WIDTH THAN THE CAPACITOR

摘要

PURPOSE: A method for manufacturing an LC circuit forming an MIM capacitor on the lower side of an inductor with a metal wiring shape is provided to minimize the loss of inductance by forming an inductor on one plane with an octagonal spiral. CONSTITUTION: A first conductive pattern(130) is formed on an insulation layer and becomes a bottom electrode of a capacitor. A dielectric layer pattern(140) to accumulate charges is formed on the first conductive pattern. A second conductive pattern(150) is formed on the dielectric layer pattern and becomes a top electrode of the capacitor.