| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a coating agent for a resist pattern, which is excellent in performance (curing performance) of insolubilizing and curing a resist pattern, and allows an insoluble resist pattern which is sufficiently stable against a subsequent exposure process, a developing solution and a positive radiation-sensitive resin composition. <P>SOLUTION: The coating agent for a resist pattern contains: (I) a resin having a structural unit derived from at least one monomer of hydroxyacrylanilide and hydroxymethacrylanilide; and (II) a radical generator. <P>COPYRIGHT: (C)2010,JPO&INPIT |
