| 摘要 |
<p><P>PROBLEM TO BE SOLVED: To simplify an apparatus and process for treating exhaust gases discharged from a plurality of semiconductor manufacturing apparatuses. <P>SOLUTION: The exhaust gas treatment apparatus 10 treats the exhaust gas discharged from the plurality of semiconductor manufacturing apparatuses 20, and includes a gas storage part 40 for gathering, mixing and storing the respective exhaust gases discharged from the plurality of semiconductor manufacturing apparatuses 20, a dilution part 50 for diluting the mixed gas mixed in the gas storage part 40 by a dilution gas, and a detoxifying part 52 for detoxifying the mixed gas. <P>COPYRIGHT: (C)2010,JPO&INPIT</p> |
