| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a positive resist composition capable of forming a resist film having a surface having high hydrophobicity, and to provide a resist pattern forming method by use of the positive resist composition. <P>SOLUTION: The positive resist composition contains a high molecular compound (A1) having a constituent unit (aO) containing "cyclic group including -SO<SB>2</SB>-" at a terminal of side chain and a constituent unit (a1) induced from an acrylic ester including an acid dissociative dissolution inhibition group, an acid generator component (B), and a fluorine containing resin component having a group containing the acid dissociative dissolution inhibition group which may have fluorine atoms and a constituent unit (f1) including at least one fluorine atom. <P>COPYRIGHT: (C)2010,JPO&INPIT |
