发明名称 METHOD OF MANUFACTURING SEMICONDUCTOR COMPOSITE DEVICE
摘要 <P>PROBLEM TO BE SOLVED: To provide a junction form between semiconductor thin films and different types of substrates, capable of obtaining stable bonding characteristics utilizing intermolecular force between the semiconductor thin films and metal. <P>SOLUTION: A metal oxide layer 103 is provided on the surface of a metal layer 102 provided on a substrate 101. By having semiconductor thin films 304-308 made to abut against the metal layer 102 to form a region 410 including an oxide of a metal element among them, the semiconductor thin films 304-308 is bonded to the metal layer 102. <P>COPYRIGHT: (C)2010,JPO&INPIT
申请公布号 JP2010212732(A) 申请公布日期 2010.09.24
申请号 JP20100126203 申请日期 2010.06.01
申请人 OKI DATA CORP;OKI DIGITAL IMAGING CORP 发明人 OGIWARA MITSUHIKO
分类号 H01L33/00 主分类号 H01L33/00
代理机构 代理人
主权项
地址