| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a positive resist composition having high sensitivity and high resolution, giving a square profile, and having a low initial value of particles and excellent reproducibility of curvatures; and to provide a pattern forming method using the composition. <P>SOLUTION: The positive resist composition contains: a resin exhibiting an increase in solubility with an alkali developing solution by the action of an acid; a triaryl sulfonium salt having a fluorine atom in a cationic moiety, the salt generating an aliphatic or aromatic sulfonic acid having a fluorine atom by irradiation with actinic rays or radiation; a nitrogen-containing basic compound; and as an organic solvent, a solvent in the following group A, and a solvent selected from the following group B and/or a solvent selected from group C. The pattern forming method is implemented by using the composition. The solvent groups are: the group A including propylene glycol monoalkylether carboxylate; the group B including propylene glycol monoalkylether and alkoxy alkyl propionate; and the group C including γ-butyrolactone, ethylene carbonate, propylene carbonate and cyclohexanone. <P>COPYRIGHT: (C)2010,JPO&INPIT |
