| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a positive resist composition and a resist pattern forming method using the positive resist composition. <P>SOLUTION: The positive resist composition contains: a base material component (A) in which the solubility to an alkali developer is increased by the action of an acid; and an acid generator component (B) that generates the acid by exposure. The base material component (A) has: a high molecular compound (A1-1) with a constituent unit (a0-1) containing a cyclic group including -SO<SB>2</SB>- in a ring skeleton; and the same constituent unit (a0-1) as the constituent unit contained in the high molecular compound (A1-1). The base material component also contains a high molecular compound (A1-2) in which a ratio of containing the constituent unit (a0-1) (mol%) is different from that of the high molecular compound (A1-1). <P>COPYRIGHT: (C)2010,JPO&INPIT |
