发明名称 |
METHOD FOR MAKING NANOSTRUCTURED SURFACES |
摘要 |
<p>A continuous method for making a nanostructured surface comprises (a) placing a substrate comprising a nanoscale mask on a cylindrical electrode in a vacuum vessel, (b) introducing etchant gas to the vessel at a predetermined pressure, (c) generating plasma between the cylindrical electrode and a counter-electrode, (d) rotating the cylindrical electrode to translate the substrate, and (e) anisotropically etching a surface of the substrate to provide anisotropic nanoscale features on the surface.</p> |
申请公布号 |
WO2010078306(A3) |
申请公布日期 |
2010.09.23 |
申请号 |
WO2009US69662 |
申请日期 |
2009.12.29 |
申请人 |
3M INNOVATIVE PROPERTIES COMPANY;DAVID, MOSES M.;YU, TA-HUA |
发明人 |
DAVID, MOSES M.;YU, TA-HUA |
分类号 |
B82B3/00 |
主分类号 |
B82B3/00 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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