发明名称 SUBSTRATE PROCESSING APPARATUS
摘要 In a substrate processing apparatus, a processing module includes a processing unit for performing a predetermined processing on a substrate accommodated in a processing chamber, and a transfer module includes a transfer chamber having a loading/unloading port for mounting thereon a carrier accommodating therein the substrate in a plural number and a transfer mechanism for transferring the substrates between the processing module and the carrier mounted on the loading/unloading port in the transfer chamber. Further, a substrate accommodation unit includes a substrate accommodation chamber communicating with the transfer chamber via a transfer opening and accommodating therein the substrates arranged vertically, a vertically movable gate provided at the transfer opening, the gate separating the substrate accommodation chamber from the transfer chamber and a gas supply unit for supplying a gas into the substrate accommodation chamber. The substrates processed by the processing unit are accommodated in the substrate accommodation chamber.
申请公布号 US2010236718(A1) 申请公布日期 2010.09.23
申请号 US20100723950 申请日期 2010.03.15
申请人 TOKYO ELECTRON LIMITED 发明人 WAKABAYASHI SHINJI
分类号 C23F1/08;B05C13/00 主分类号 C23F1/08
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