| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide an immersion which can control and surround an immersion lens solution in operating steps of an immersion lithography system. <P>SOLUTION: A solution and seal ring 418 are provided. The solution is an immersion solution for use on a wafer in immersion lithography steps. The seal ring 418 covers the predetermined part of the edge of the wafer. The solution is prevented from being leaked from the covered edge of the wafer when used in the immersion lithography steps. <P>COPYRIGHT: (C)2007,JPO&INPIT |
