发明名称 AMORPHOUS OXIDE AND FIELD-EFFECT TRANSISTOR USING SAID OXIDE
摘要 FIELD: chemistry. ^ SUBSTANCE: amorphous oxide compound having a composition which, when said compound is in crystalline state, has formula In2-xM3xO3(Zn1-YM2YO)m, where M2 is Mg or Ca, M3 is B, Al, Ga or Y, 0 ëñ X ëñ 2, 0 ëñ Y ëñ 1, and m equals 0 or is a positive integer less than 6, or a mixture of such compounds, where the said amorphous oxide compound also contains one type of element or several elements selected from a group consisting of Li, Na, Mn, Ni, Pd, Cu, Cd, C, N, P, Ti, Zr, V, Ru, Ge, Sn and F, and the said amorphous oxide compound has concentration of electronic carriers between 1015/cm3 and 1018/cm3. ^ EFFECT: amorphous oxide which functions as a semiconductor for use in the active layer of a thin-film transistor. ^ 6 cl, 8 dwg
申请公布号 RU2399989(C2) 申请公布日期 2010.09.20
申请号 RU20080143344 申请日期 2008.10.31
申请人 KEHNON KABUSIKI KAJSJA;TOKIO INSTIT'JUT OF TEKNOLODZHI 发明人 SANO MASAFUMI;NAKAGAVA KATSUMI;KHOSONO KHIDEO;KAMIJA TOSIO;NOMURA KENDZI
分类号 H01L29/786 主分类号 H01L29/786
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