| 摘要 |
PURPOSE: A fuse of a semiconductor device and a method for forming the same are provided to prevent the formation of a fuse in blowing the fuse by forming a metal fuse having high tension. CONSTITUTION: A first interlayer insulating film(10) is comprised of a material forming a tension force. The fuse of the semiconductor device comprises a fuse metal(30) which is formed on the first interlayer insulating film and has the tension force higher than first interlayer insulating film. The fuse metal also includes a second interlayer insulating film. |
