发明名称 HMETHOD AND DEVICE FOR MEASURING HEAT FLUX
摘要 <p><P>PROBLEM TO BE SOLVED: To provide a heat flux measuring method capable of easily determining heat flux distribution, and a heat flux measuring device. <P>SOLUTION: The heat flux measuring method measures the surface of a measurement target set in a fluid and includes a first process of forming the measurement target by forming, on a substrate, a thin film made of a material having a relatively lower thermal conductivity than that of the substrate; a second process of heating the substrate; a third process of measuring the temperature of the substrate and temperature distribution of the thin film surface while the fluid is allowed to flow the thin film surface; and a forth process of calculating heat flux distribution of the thin film surface based on the measured values of the substrate temperature and temperature distribution of the thin film surface. <P>COPYRIGHT: (C)2010,JPO&INPIT</p>
申请公布号 JP2010203804(A) 申请公布日期 2010.09.16
申请号 JP20090047162 申请日期 2009.02.27
申请人 MITSUBISHI HEAVY IND LTD 发明人 NAKAMURA TAKESHI;SAKAMOTO YASUAKI
分类号 G01K17/16 主分类号 G01K17/16
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