| 摘要 |
<p><P>PROBLEM TO BE SOLVED: To provide a surface inspecting apparatus allowing easy correction of detection sensitivity and a method for correcting the same. <P>SOLUTION: In the surface inspecting apparatus, the surface of a reference foreign material wafer 110 is scanned with illuminating light while irradiating the surface of the wafer 110 with the illuminating light by an illuminating optical system 2, the light scattered from the surface of the wafer 110 is detected by detectors 31-34 of a detection optical system 3, correction parameters Comp for correcting the detection sensitivity of the photomultiplier tubes 331-334 of the detectors 31-34 are calculated using the detection results of the scattered light and a predetermined reference value, and the correction parameters Comp are managed by separating the correction parameters into time deterioration parameters P, optical characteristic parameters Opt, and sensor characteristic parameters Lr. <P>COPYRIGHT: (C)2010,JPO&INPIT</p> |
